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Diffusion barrier

Fan, W, B Kabius, J.M Miller, S Saha, J.A Carlisle, O Auciello, R.P.H Chang, and Ramamoorthy Ramesh. "Materials science and integration bases for fabrication of (Ba xSr1-x)TiO3 thin film capacitors with layered Cu-based electrodes." Journal of Applied Physics 94 (2003) 6192–6200.

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Auciello, O, A.M Dhote, Ramamoorthy Ramesh, B.T Liu, S Aggarwal, A.H Mueller, N.A Suvarova, and E.A Irene. "Development of materials integration strategies for electroceramic film-based devices via complementary in situ and ex situ studies of film growth and interface processes." Integrated Ferroelectrics. Vol. 46. 2002. 295–306.

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Aggarwal, S, B Nagaraj, I.G Jenkins, H Li, R.P Sharma, L Salamanca-Riba, Ramamoorthy Ramesh, A.M Dhote, A.R Krauss, and O Auciello. "Correlation between oxidation resistance and crystallinity of Ti-Al as a barrier layer for high-density memories." Acta Materialia 48 (2000) 3387–3394.

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