%0 Journal Article
%K Electrodes
%K Crystal structure
%K Electric properties
%K Ferroelectricity
%K Ferroelectric devices
%K Ferroelectric capacitors
%K Interfaces (materials)
%K Diffusion barrier
%K X-ray photoelectron spectroscopy
%K Chemical reactions
%K Diffusion in solids
%K Intermetallics
%K Oxidation resistance
%K Segregation (metallography)
%K High density memories
%K Titanium aluminum
%K Titanium alloys
%A S Aggarwal
%A B Nagaraj
%A I.G Jenkins
%A H Li
%A R.P Sharma
%A L Salamanca-Riba
%A Ramamoorthy Ramesh
%A A.M Dhote
%A A.R Krauss
%A O Auciello
%B Acta Materialia
%D 2000
%G eng
%P 3387-3394
%R 10.1016/S1359-6454(00)00148-8
%T Correlation between oxidation resistance and crystallinity of Ti-Al as a barrier layer for high-density memories
%V 48