The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering

Date Published
01/2012
Publication Type
Journal Article
Authors
DOI
10.1088/0022-3727/45/1/012003
Abstract

Contrary to paradigm, magnetron discharge runaway cannot always be related to self-sputtering. We report here that the high density discharge can be observed with all conducting targets, including low sputter yield materials such as carbon. Runaway to a high density discharge is therefore generally based on self-sputtering in conjunction with the recycling of gas atoms in the magnetic field-affected pre-sheath. A generalized runaway condition can be formulated, offering a pathway to a time-dependent model for high-power impulse magnetron sputtering that includes rarefaction and an explanation for the termination of runaway.

Journal
Journal of Physics D: Applied Physics
Volume
45
Year of Publication
2012
Issue
1
Pagination
012003
ISSN Number
0022-3727
Short Title
J. Phys. D: Appl. Phys.
Organizations
Research Areas
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