The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering
Date Published |
01/2012
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Publication Type | Journal Article
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Authors | |
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DOI |
10.1088/0022-3727/45/1/012003
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Abstract |
Contrary to paradigm, magnetron discharge runaway cannot always be related to self-sputtering. We report here that the high density discharge can be observed with all conducting targets, including low sputter yield materials such as carbon. Runaway to a high density discharge is therefore generally based on self-sputtering in conjunction with the recycling of gas atoms in the magnetic field-affected pre-sheath. A generalized runaway condition can be formulated, offering a pathway to a time-dependent model for high-power impulse magnetron sputtering that includes rarefaction and an explanation for the termination of runaway. |
Journal |
Journal of Physics D: Applied Physics
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Volume |
45
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Year of Publication |
2012
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Issue |
1
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Pagination |
012003
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ISSN Number |
0022-3727
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Short Title |
J. Phys. D: Appl. Phys.
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Organizations | |
Research Areas | |
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