%0 Journal Article
%A André Anders
%A Jiří Čapek
%A Matêj Hála
%A Ludvik Martinu
%B Journal of Physics D: Applied Physics
%D 2012
%N 1
%P 012003
%R 10.1088/0022-3727/45/1/012003
%T The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering
%V 45
%8 01/2012
%! J. Phys. D: Appl. Phys.
%X <p>Contrary to paradigm, magnetron discharge runaway cannot always be related to self-sputtering. We report here that the high density discharge can be observed with all conducting targets, including low sputter yield materials such as carbon. Runaway to a high density discharge is therefore generally based on self-sputtering in conjunction with the recycling of gas atoms in the magnetic field-affected pre-sheath. A generalized runaway condition can be formulated, offering a pathway to a time-dependent model for high-power impulse magnetron sputtering that includes rarefaction and an explanation for the termination of runaway.</p>