Improved structural and electrical properties of thin ZnO:Al films by dc filtered cathodic arc deposition

Date Published
03/2012
Publication Type
Journal Article
Authors
DOI
10.1557/jmr.2011.342
Abstract

Transparent conducting oxide films are usually several 100-nm thick to achieve the required low sheet resistance. In this study, we show that the filtered cathodic arc technique produces high-quality low-cost ZnO:Al material for comparably smaller thicknesses than achieved by magnetron sputtering, making arc deposition a promising choice for applications requiring films less than 100-nm thick. A mean surface roughness less than 1 nm is observed for ZnO:Al films less than 100-nm thick, and 35-nm-thick ZnO:Al films exhibit Hall mobility of 28 cm2/Vs and a low resistivity of 6.5 × 10−4 Ωcm. Resistivity as low as 5.2 × 10−4 Ωcm and mobility as high as 43.5 cm2/Vs are obtained for 135-nm films.

Journal
Journal of Materials Research
Volume
27
Year of Publication
2012
Issue
05
Pagination
857 - 862
ISSN Number
0884-2914
Short Title
J. Mater. Res.
Keywords
Organizations
Research Areas
Download citation