Rebecca D Stern

Stern, Rebecca D, Danielle C Hutchison, Morgan R Olsen, Lev N Zakharov, May Nyman, and Kristin A Persson. "Alkyltin Keggin clusters as EUVL photoresist technology." International Conference on Extreme Ultraviolet Lithography 2019International Conference on Extreme Ultraviolet Lithography 2019. Ed. Kurt G Ronse, Paolo A Gargini, Patrick P Naulleau, and Toshiro Itani. Monterey, United States: SPIE, 2019.

Hutchison, Danielle C, Rebecca D Stern, Morgan R Olsen, Lev N Zakharov, Kristin A Persson, and May Nyman. "Alkyltin clusters: the less symmetric Keggin isomers." Dalton Transactions 47.29 (2018) 9804–9813.