Kurt G Ronse

Publications

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2019

Stern, Rebecca D, Danielle C Hutchison, Morgan R Olsen, Lev N Zakharov, May Nyman, and Kristin A Persson. "Alkyltin Keggin clusters as EUVL photoresist technology." International Conference on Extreme Ultraviolet Lithography 2019International Conference on Extreme Ultraviolet Lithography 2019. Ed. Kurt G Ronse, Paolo A Gargini, Patrick P Naulleau, and Toshiro Itani. Monterey, United States: SPIE, 2019.