Optical far-and near-field femtosecond laser ablation of Si for nanoscale chemical analysis

Date Published
09/2009
Publication Type
Journal Article
Authors
DOI
10.1007/s00216-009-3136-7
Abstract

Extending spatial resolution in laser-based chemical analysis to the nanoscale becomes increasingly important as nanoscience and nanotechnology develop. Implementation of femtosecond laser pulses arises as a basic strategy for increasing resolution since it is associated with spatially localized material damage. In this work we study femtosecond laser far- and near-field processing of silicon (Si) at two distinct wavelengths (400 and 800 nm), for nanoscale chemical analysis. By tightly focusing femtosecond laser beams in the far-field, we were able to produce sub-micrometer craters. In order to further reduce the crater size, similar experiments were performed in the near-field through sub-wavelength apertures, resulting in the formation of sub-30-nm craters. Laser-induced breakdown spectroscopy (LIBS) was used for chemical analysis with a goal to identify the minimum crater size from which spectral emission could be measured. Emission from sub-micrometer craters (full width at half maximum) was possible, which are among the smallest ever reported for femtosecond LIBS.

Journal
Analytical and Bioanalytical Chemistry
Volume
396
Year of Publication
2009
Issue
1
Pagination
173-180
ISSN Number
1618-2642
Short Title
Anal Bioanal Chem.
Keywords
Organizations
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