@article{25369, keywords = {Laser ablation, Silicon, Libs, Far-field, Laser spectroscopy, Near-field, Semiconductor materials}, author = {Vassilia Zorba and Xianglei Mao and Richard E Russo}, title = {Optical far-and near-field femtosecond laser ablation of Si for nanoscale chemical analysis}, abstract = {
Extending spatial resolution in laser-based chemical analysis to the nanoscale becomes increasingly important as nanoscience and nanotechnology develop. Implementation of femtosecond laser pulses arises as a basic strategy for increasing resolution since it is associated with spatially localized material damage. In this work we study femtosecond laser far- and near-field processing of silicon (Si) at two distinct wavelengths (400 and 800 nm), for nanoscale chemical analysis. By tightly focusing femtosecond laser beams in the far-field, we were able to produce sub-micrometer craters. In order to further reduce the crater size, similar experiments were performed in the near-field through sub-wavelength apertures, resulting in the formation of sub-30-nm craters. Laser-induced breakdown spectroscopy (LIBS) was used for chemical analysis with a goal to identify the minimum crater size from which spectral emission could be measured. Emission from sub-micrometer craters (full width at half maximum) was possible, which are among the smallest ever reported for femtosecond LIBS.
}, year = {2009}, journal = {Analytical and Bioanalytical Chemistry}, volume = {396}, pages = {173-180}, month = {09/2009}, issn = {1618-2642}, doi = {10.1007/s00216-009-3136-7}, language = {eng}, }