Epitaxial ferroelectric thin films for memory applications

Publication Type
Journal Article
Authors
DOI
10.1016/0921-5107(94)90258-5
Abstract
Epitaxial ferroelectric Pb0.9La0.1Zr0.2Ti0.8O3 (PLZT) thin film capacitors with perovskite metal oxide electrodes (such as YBa2Cu3O7) were grown on single-crystal LaAlO3 and on buffered [100] Si. Structural studies using X-ray diffraction and transmission electron microscopy show that the PLZT layer is free of large-angle grain boundaries (i.e. it is single crystal like). Chemical analysis by Rutherford backscattering shows the composition of the PLZT layer to be close to that of the target. Ferroelectric hysteresis measurements using both pulsed measurements and a variable frequency Sawyer-Tower circuit yield remnant polarization values (at 5 V) in the range 10-30 μC cm-2 (depending on deposition conditions) with a coercive field in the range 35-80 kV cm-1. These heterostructures also show excellent resistance to bipolar fatigue, aging and logic state retention characteristics. © 1994.
Notes
cited By 47
Journal
Materials Science and Engineering B
Volume
22
Year of Publication
1994
Number
2-3
Pagination
283-289
ISSN Number
09215107
Keywords
Research Areas
Download citation