Background gas effect on the generation of nanopatterns on a pure silicon wafer with multiple femtosecond near field laser ablation

Date Published
12/2007
Publication Type
Journal Article
Authors
DOI
10.1063/1.2827199
Abstract

Significant laser energy was transferred from the near field scanning optical microscope tip to a silicon wafer producing nanopatterns on the sample surface. The patterns changed from nanoprotrusions to nanocraters when the background gas was changed from air to argon. Two physical mechanisms were attributed to this dramatic change, namely, oxidation and laser ablation. When air was present, oxidation dominated over ablation in the formation of the nanoprotrusions obtained after multiple laser pulses. When oxygen was absent, e.g., pure argon was the background gas, laser ablation was dominant, and nanocraters resulted after multiple laser pulses.

Notes

IN FILE

Journal
Applied Physics Letters
Volume
91
Year of Publication
2007
Issue
25
Number
91251113
Short Title
Appl. Phys. Lett.
Keywords
Organizations
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