W.A Doolittle

Publications

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2008

Ihlefeld, J.F, W Tian, Z.K Liu, W.A Doolittle, M Bernhagen, P Reiche, R Uecker, Ramamoorthy Ramesh, and D.G Schlom. "Adsorption-controlled growth of BiFeO3 by MBE and integration with wide band gap semiconductors." IEEE International Symposium on Applications of Ferroelectrics. Vol. 3. 2008.