Tien-Lin Lee

Lebens-Higgins, Zachary W, Hyeseung Chung, Mateusz J Zuba, Jatinkumar Rana, Yixuan Li, Nicholas V Faenza, Nathalie Pereira, Bryan D McCloskey, Fanny Rodolakis, Wanli Yang, M Stanley Whittingham, Glenn G Amatucci, Ying Shirley Meng, Tien-Lin Lee, and Louis F. J Piper. "How Bulk Sensitive is Hard X-ray Photoelectron Spectroscopy: Accounting for the Cathode–Electrolyte Interface when Addressing Oxygen Redox." The Journal of Physical Chemistry Letters 11.6 (2020) 2106–2112.