%0 Journal Article
%K Optimization
%K Microstructure
%K Thin films
%K Sputter deposition
%K Electrodes
%K Hysteresis
%K Lanthanum compounds
%K Doping (additives)
%K Lead compounds
%K Capacitors
%K Lead zirconate titanate (PZT)
%K Fatigue of materials
%K Imprint behavior
%K Fatigue performance
%K High density nonvolatile memory (HDNVM)
%K Hysteresis loop characteristics
%K Oxide electrode technology
%A B.A Tuttle
%A H.N Al-Shareef
%A W.L Warren
%A M.V Raymond
%A T.J Headley
%A J.A Voigt
%A J Evans
%A Ramamoorthy Ramesh
%B Microelectronic Engineering
%D 1995
%G eng
%P 223-230
%R 10.1016/0167-9317(95)00150-6
%T La0.5Sr0.5CoO3 electrode technology for Pb(Zr,Ti)O3 thin film nonvolatile memories
%V 29