%0 Conference Paper
%A Rebecca D Stern
%A Danielle C Hutchison
%A Morgan R Olsen
%A Lev N Zakharov
%A May Nyman
%A Kristin A Persson
%A Kurt G Ronse
%A Paolo A Gargini
%A Patrick P Naulleau
%A Toshiro Itani
%B International Conference on Extreme Ultraviolet Lithography 2019International Conference on Extreme Ultraviolet Lithography 2019
%C Monterey, United States
%D 2019
%G eng
%I SPIE
%R 10.1117/12.253863910.1117/12.2538639.6095053706001
%S International Conference on Extreme Ultraviolet Lithography 2019International Conference on Extreme Ultraviolet Lithography 2019
%T Alkyltin Keggin clusters as EUVL photoresist technology
%8 09/2019