%0 Journal Article
%K Texture
%K Amorphous state
%K Ceramics
%K Crystal orientation
%K Crystallization
%K Ion beam effects
%K Sputtered coatings
%K Yttrium compounds
%K Zirconium compounds
%A Paul H Berdahl
%A Ronald P Reade
%A Jinping Liu
%A Richard E Russo
%A Les Fritzemeier
%A David Buczek
%A Urs Schoop
%B Applied Physics Letters
%D 2003
%F Laser
%G eng
%N 3
%P 343-345
%R 10.1063/1.1536266
%T Oblique ion texturing of yttria-stabilized zirconia: the {211}<111> structure
%V 82
%2 LBNL-51802
%8 11/2002
%X <p>Amorphous (Zr,Y)O<sub>x</sub> films were synthesized by reactive magnetron sputtering and subsequently crystallized by oblique ion bombardment. Crystalline texture nucleated by the ion beam was replicated by solid-phase epitaxial growth throughout the formerly amorphous yttria-stabilized zirconia (YSZ) film. The resulting YSZ films have (211) orientation normal to the substrate with in-plane directions (111), parallel, and (110), transverse, to the azimuth of the ion beam. We hypothesize that the texture mechanism involves ion-induced film compression and shear. The results, taken together with prior work, show that oblique ion texturing of amorphous films is a general phenomenon that can be used to fabricate substrates with more than one type of crystallographic orientation.</p>