%0 Journal Article
%A Matthew R Field
%A Dougal G McCulloch
%A Sunnie H.N Lim
%A André Anders
%A Vicki J Keast
%A R.W Burgess
%B Journal of Physics: Condensed Matter
%D 2008
%G eng
%P 175216
%R 10.1088/0953-8984/20/17/175216
%T The structure and electron energy loss near edge structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering
%V 20
%1 <p>Windows and Daylighting Group</p>
%2 LBNL-580E
%8 04/2008
%X <p>The microstructure and energy-loss near-edge structure (ELNES) of pulsed cathodic arc and pulsed magnetron sputtered WO<sub>3</sub> thin films were investigated. It was found that the cathodic arc deposited material consisted of the α-WO<sub>3</sub> phase with a high degree of crystallinity. In contrast, the magnetron sputtered material was highly disordered making it difficult to determine its phase. A self-consistent real space multiple scattering approach was used to calculate the NES of the various phases of WO<sub>3</sub>. Each phase was found to exhibit a unique NES allowing different phases of WO<sub>3</sub> to be identified. The real space approach also allowed the origin of the main features in the NES to be investigated as the cluster size increased. The calculated NES for the room temperature γ-WO<sub>3</sub> was found to compare well to previous X-ray absorption spectra and to NES obtained by full-potential band structure calculation.</p>