%0 Journal Article
%A David Horwat
%A André Anders
%B Journal of Physics D
%D 2008
%G eng
%L LBNL-679E
%P 135210-1-6
%T Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper
%V 41
%1 <p>Windows and Daylighting Group</p>
%2 LBNL-679E