%0 Journal Article
%K Thin films
%K Copper
%K Ion implantation
%K Sputter deposition
%K Thin film deposition
%A Michael D Rubin
%A Ian G Brown
%A E Yin
%A David A Wruck
%B Journal of Applied Physics
%D 1989
%G eng
%P 3940-3942
%R 10.1063/1.344023
%T Ion Implantation of Sputtered Y-Ba-Cu-O Films
%V 66
%1 <p>Windows and Daylighting Group</p>
%2 LBL-26858
%8 10/1989
%X <p><span class="named-content">Thin films</span> of Y‐Ba‐Cu‐O were <span class="named-content">deposited</span> by rf magnetron <span class="named-content">sputtering</span> from a single stoichiometric target and then altered in composition by <span class="named-content">ion implantation.</span> Under optimum <span class="named-content">deposition</span> conditions the <span class="named-content">films</span> are deficient in Ba and <span class="named-content">Cu.</span> <span class="named-content">Ion implantation</span> of <span class="named-content">Cu</span> was performed using a metal‐vapor vacuum‐arc source having high current and a broad energy spectrum for good depth distribution. Composition was determined by <span class="named-content">Rutherford backscattering</span> spectrometry. The zero‐resistance temperature was greatly increased after implantation and reannealing. This method could be used to write <span class="named-content">superconducting</span> patterns on insulating material.</p>