%0 Conference Paper %A Jennifer T Ross %A Michael D Rubin %A Ture K Gustafson %B Materials Research Society Symposium %D 1992 %G eng %P 457 %R 10.1557/PROC-242-457 %T Crystalline Growth of Wurtzite GAN on (111) GaAs %V 242 %1
Windows and Daylighting Group
%2 LBL-32258 %XGallium Nitride films were grown on (111) Gallium Arsenide substrates using reactive rf magnetron sputtering. Despite a 20% lattice mismatch and different crystal structure, wurtzite GaN films grew epitaxially in basal orientation on (111) GaAs substrates. Heteroepitaxy was observed for growth temperatures between 550-600°C. X-ray diffraction patterns revealed (0002) GaN peak with a full-width-half-maximum (FWHM) as narrow as 0.17°. Possible surface reconstructions to explain the epitaxial growth are presented.