TY - JOUR
AU - Ramamoorthy Ramesh
AU - H Gilchrist
AU - T Sands
AU - V.G Keramidas
AU - R Haakenaasen
AU - D.K Fork
AB - Ferroelectric Pb0.9La0.1Zr0.2Ti 0.8O3 thin film capacitors with a symmetrical La-Sr-Co-O top and bottom electrodes have been grown on [001] Si with yttria stabilized zirconia (YSZ) buffer layer. A layered perovskite "template" layer (200-300 Å thick), grown between the YSZ buffer layer and the bottom La-Sr-Co-O electrode, is critical for obtaining the required orientation of the subsequent layers. When compared to the capacitors grown with the Y-Ba-Cu-O top and bottom electrodes, these structures possess two advantages: (i) the growth temperatures are lower by 60-150°C; (ii) the capacitors show a larger remnant polarization ΔP (ΔP=switched polarization-nonswitched polarization), 25-30 μC/cm2, for an applied voltage of only 2 V (applied field of 70 kV/cm). The fatigue, retention, and aging characteristics of these new structures are excellent.
BT - Applied Physics Letters
DO - 10.1063/1.110106
LA - eng
M1 - 26
N1 - cited By 325
N2 - Ferroelectric Pb0.9La0.1Zr0.2Ti 0.8O3 thin film capacitors with a symmetrical La-Sr-Co-O top and bottom electrodes have been grown on [001] Si with yttria stabilized zirconia (YSZ) buffer layer. A layered perovskite "template" layer (200-300 Å thick), grown between the YSZ buffer layer and the bottom La-Sr-Co-O electrode, is critical for obtaining the required orientation of the subsequent layers. When compared to the capacitors grown with the Y-Ba-Cu-O top and bottom electrodes, these structures possess two advantages: (i) the growth temperatures are lower by 60-150°C; (ii) the capacitors show a larger remnant polarization ΔP (ΔP=switched polarization-nonswitched polarization), 25-30 μC/cm2, for an applied voltage of only 2 V (applied field of 70 kV/cm). The fatigue, retention, and aging characteristics of these new structures are excellent.
PY - 1993
SP - 3592
EP - 3594
T2 - Applied Physics Letters
TI - Ferroelectric La-Sr-Co-O/Pb-Zr-Ti-O/La-Sr-Co-O heterostructures on silicon via template growth
VL - 63
SN - 00036951
ER -