TY - JOUR
KW - Thin films
KW - Mass spectrometry
KW - Perovskite
KW - Film growth
KW - Morphology
KW - Epitaxial growth
KW - Complex oxides
KW - Surface treatment
KW - Substrate surface
KW - Time-of-flight mass spectroscopy
KW - Basic solutions
KW - Chemical sensitivity
KW - Crystal surfaces
KW - Lattice parameters
KW - Perovskite type oxides
KW - Pseudocubic
KW - Scandates
KW - Selective wet etching
KW - Single termination
KW - Spectroscopy measurements
KW - Time of flight
KW - Wet etching
AU - J.E Kleibeuker
AU - G Koster
AU - W Siemons
AU - D Dubbink
AU - B Kuiper
AU - J.L Blok
AU - C.-H Yang
AU - J Ravichandran
AU - Ramamoorthy Ramesh
AU - J.E Elshof
AU - D.H.A Blank
AU - G Rijnders
AB - {The fabrication of well-defined, atomically sharp substrate surfaces over a wide range of lattice parameters is reported, which is crucial for atomically regulated epitaxial growth of complex oxide heterostructures. By applying a framework for controlled selective wet etching of complex oxides on the stable rare-earth scandates (REScO3)
BT - Advanced Functional Materials
DO - 10.1002/adfm.201000889
LA - eng
M1 - 20
N1 - cited By 59
N2 - {The fabrication of well-defined, atomically sharp substrate surfaces over a wide range of lattice parameters is reported, which is crucial for atomically regulated epitaxial growth of complex oxide heterostructures. By applying a framework for controlled selective wet etching of complex oxides on the stable rare-earth scandates (REScO3)
PY - 2010
SP - 3490
EP - 3496
T2 - Advanced Functional Materials
TI - Atomically defined rare-earth scandate crystal surfaces
VL - 20
SN - 1616301X
ER -