Contrary to paradigm, magnetron discharge runaway cannot always be related to self-sputtering. We report here that the high density discharge can be observed with all conducting targets, including low sputter yield materials such as carbon. Runaway to a high density discharge is therefore generally based on self-sputtering in conjunction with the recycling of gas atoms in the magnetic field-affected pre-sheath. A generalized runaway condition can be formulated, offering a pathway to a time-dependent model for high-power impulse magnetron sputtering that includes rarefaction and an explanation for the termination of runaway.
BT - Journal of Physics D: Applied Physics DA - 01/2012 DO - 10.1088/0022-3727/45/1/012003 IS - 1 N2 -Contrary to paradigm, magnetron discharge runaway cannot always be related to self-sputtering. We report here that the high density discharge can be observed with all conducting targets, including low sputter yield materials such as carbon. Runaway to a high density discharge is therefore generally based on self-sputtering in conjunction with the recycling of gas atoms in the magnetic field-affected pre-sheath. A generalized runaway condition can be formulated, offering a pathway to a time-dependent model for high-power impulse magnetron sputtering that includes rarefaction and an explanation for the termination of runaway.
PY - 2012 EP - 012003 ST - J. Phys. D: Appl. Phys. T2 - Journal of Physics D: Applied Physics TI - The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering VL - 45 SN - 0022-3727 ER -