TY - JOUR
KW - Temperature
KW - Measurement
KW - Film
KW - Films
KW - Laser
KW - Excimer
KW - Excimer laser
KW - Silicon
KW - Excimer laser
KW - Interface
KW - Polycrystalline
AU - Xianfan Xu
AU - Costas P Grigoropoulos
AU - Richard E Russo
AN - 46
BT - Appl.Phys.Lett.
LA - eng
LB - Laser
N1 - <p>NOT IN FILE</p>
PY - 1994
SP - 1745
EP - 1747
T2 - Appl.Phys.Lett.
TI - Measurement of solid/liquid interface temperature during pulsed excimer laser malting of polycrystalline silicon films
VL - 65
ER -