TY - JOUR KW - Texture KW - Amorphous state KW - Ceramics KW - Crystal orientation KW - Crystallization KW - Ion beam effects KW - Sputtered coatings KW - Yttrium compounds KW - Zirconium compounds AU - Paul H Berdahl AU - Ronald P Reade AU - Jinping Liu AU - Richard E Russo AU - Les Fritzemeier AU - David Buczek AU - Urs Schoop AB -

Amorphous (Zr,Y)Ox films were synthesized by reactive magnetron sputtering and subsequently crystallized by oblique ion bombardment. Crystalline texture nucleated by the ion beam was replicated by solid-phase epitaxial growth throughout the formerly amorphous yttria-stabilized zirconia (YSZ) film. The resulting YSZ films have (211) orientation normal to the substrate with in-plane directions (111), parallel, and (110), transverse, to the azimuth of the ion beam. We hypothesize that the texture mechanism involves ion-induced film compression and shear. The results, taken together with prior work, show that oblique ion texturing of amorphous films is a general phenomenon that can be used to fabricate substrates with more than one type of crystallographic orientation.

BT - Applied Physics Letters C2 - LBNL-51802 DA - 11/2002 DO - 10.1063/1.1536266 IS - 3 LA - eng LB - Laser N1 -

LBNL-51802 NOT IN FILE

N2 -

Amorphous (Zr,Y)Ox films were synthesized by reactive magnetron sputtering and subsequently crystallized by oblique ion bombardment. Crystalline texture nucleated by the ion beam was replicated by solid-phase epitaxial growth throughout the formerly amorphous yttria-stabilized zirconia (YSZ) film. The resulting YSZ films have (211) orientation normal to the substrate with in-plane directions (111), parallel, and (110), transverse, to the azimuth of the ion beam. We hypothesize that the texture mechanism involves ion-induced film compression and shear. The results, taken together with prior work, show that oblique ion texturing of amorphous films is a general phenomenon that can be used to fabricate substrates with more than one type of crystallographic orientation.

PY - 2003 SP - 343 EP - 345 T2 - Applied Physics Letters TI - Oblique ion texturing of yttria-stabilized zirconia: the {211}<111> structure VL - 82 SN - 0003-6951 ER -