@inproceedings{Schrott2003287, keywords = {Electric potential, Hysteresis, Ferroelectric materials, Carrier concentration, Field effect transistors, Solid solutions, Gate voltage}, author = {A.G Schrott and J.A Misewich and Ramamoorthy Ramesh and V Nagarajan}, editor = {Ginley D and Guha S and Carter S and Chambers S.A and Droopad R and Hosono H and Paine D.C and Schlom D.G and Tate J}, title = {Ferroelectric field effect device}, abstract = {

A ferroelectric field effect transistor with an oxide channel layer and a lead zirconate titanate gate oxide has been fabricated. The channel is a strontium ruthenate/titanate solid solution with n type semiconducting behavior, which has sufficient OFF-state free carrier concentration to provide proper balancing charge for ferroelectric stability. The dependence of channel resistance with gate voltage at room temperature yields a hysteresis curve with two state at zero volts with a ΔR/R of 75\% and a coercive voltage of 3 volts. The device was subjected to more than 1010 cycles with no degradation and was also operated at 60{\textdegree} C with a only a slight reduction in the switching ratio.

}, year = {2003}, booktitle = {Proceedings of the Materials Research Society Symposium -}, journal = {Proceedings of the Materials Research Society Symposium -}, series = {Proceedings of the Materials Research Society Symposium -}, volume = {747}, pages = {287-292}, issn = {02729172}, note = {

cited By 1

}, language = {eng}, }