@article{33520,
  keywords = {Thin films, Mass spectrometry, Perovskite, Film growth, Morphology, Epitaxial growth, Complex oxides, Surface treatment, Substrate surface, Time-of-flight mass spectroscopy, Basic solutions, Chemical sensitivity, Crystal surfaces, Lattice parameters, Perovskite type oxides, Pseudocubic, Scandates, Selective wet etching, Single termination, Spectroscopy measurements, Time of flight, Wet etching},
  author = {J.E Kleibeuker and G Koster and W Siemons and D Dubbink and B Kuiper and J.L Blok and C.-H Yang and J Ravichandran and Ramamoorthy Ramesh and J.E Elshof and D.H.A Blank and G Rijnders},
  title = {Atomically defined rare-earth scandate crystal surfaces},
  abstract = {{The fabrication of well-defined, atomically sharp substrate surfaces over a wide range of lattice parameters is reported, which is crucial for atomically regulated epitaxial growth of complex oxide heterostructures. By applying a framework for controlled selective wet etching of complex oxides on the stable rare-earth scandates (REScO3)},
  year = {2010},
  journal = {Advanced Functional Materials},
  volume = {20},
  number = {20},
  pages = {3490-3496},
  issn = {1616301X},
  doi = {10.1002/adfm.201000889},
  note = {cited By 59},
  language = {eng},
}