@article{31229, keywords = {Modeling, Thermal conductivity, Pressure, Surface roughness, Contact resistance, Errors, Surface energy, Surface science}, author = {Ravi S Prasher}, title = {Surface chemistry and characteristics based model for the thermal contact resistance of fluidic interstitial thermal interface materials}, abstract = {

Microprocessor powers are increasing at a phenomenal rate, which requires very small thermal resistance between the die (chip) and the ambient, if the current economical methods of conduction and convection cooling are to be utilized. A typical thermal solution in …

}, year = {2001}, journal = {J. Heat Transfer}, month = {02/2001}, publisher = {… .asmedigitalcollection.asme.org}, doi = {10.1115/1.1388301}, language = {eng}, }