@article{14443,
  keywords = {Laser radiation, Copper oxides, High-tc superconductors, Barium oxides, Film growth, Yttrium oxides, Cerium oxides, Crystal structure, Energy beam deposition films, Ion beams, Physical vapor deposition},
  author = {Ronald P Reade and Stefan R Church and Richard E Russo},
  title = {Ion assisted pulsed laser deposition},
  abstract = {<p>Ion bombardment on the surface of a substrate during deposition of a thin film [ion-assisted (IA) deposition] is used to control thin-film crystalline orientation and phase. Ion-assisted deposition is demonstrated with the relatively new pulsed-laser deposition (PLD) technique, a method of thin-film growth that has shown promise for the synthesis of high-temperature superconductor and other complex oxide films. A versatile vacuum chamber with independent control of ion-gun parameters was developed for ion-assisted pulsed-laser deposition (IAPLD). Control of crystalline orientation and alignment of yttria-stabilized zirconia and CeO<sub>2</sub> layers for use in YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-δ</sub> superconductor devices is demonstrated using this IAPLD technology.</p>},
  year = {1995},
  booktitle = {Review of Scientific Instrumentation},
  journal = {Review of Scientific Instrumentation},
  series = {Review of Scientific Instrumentation},
  volume = {66},
  pages = {3610-3614},
  doi = {10.1063/1.1146496},
  language = {eng},
}