@article{25249,
  keywords = {deposition, pulsed laser deposition, laser, ybacuo, layers, structure, pulsed laser, pulsed-laser, layer, dielectric, laser deposition, pulsed-laser-deposition, amorphous, multichip modules},
  author = {Ronald P Reade and Paul H Berdahl and Leonard W Schaper and Richard E Russo},
  title = {Y-Ba-Cu-O multilayer structures with amorphous dielectric layers for multichip modules using ion-assisted pulsed laser deposition},
  abstract = {<p>Existing technology to construct high‐temperature superconductor(HTSC) multichip modules (MCM’s) incorporating several YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7−δ</sub>(YBCO)thin films and thick dielectric layers are based on epitaxial growth of all layers from the template of a single‐crystal substrate. This work demonstrates an alternate method to fabricate these structures: the use of a biaxially aligned yttria‐stabilized zirconia (YSZ) intermediate layer deposited by ion‐assisted pulsed‐laser deposition. Using this technique, a YBCO thin film with <em>T</em> <sub> <em>c</em> </sub>∼87 K and <em>J</em> <sub> <em>c</em> </sub>∼3×10<sup>5</sup> A/cm<sup>2</sup> was grown on a 5 μm amorphous SiO<sub>2</sub> layer. In addition, YBCO/YSZ/SiO<sub>2</sub>/YSZ/YBCO/CeO<sub>2</sub>/YSZ and YBCO/YSZ/amorphous‐YSZ/YBCO/CeO<sub>2</sub>/YBCO multilayer structures were constructed.</p>},
  year = {1995},
  journal = {Applied Physics Letters},
  volume = {66},
  pages = {2001-2003},
  doi = {10.1063/1.114285},
  note = {<p>LBNL-36910 NOT IN FILE</p>},
  language = {eng},
}