@article{25053,
  keywords = {Texture, Amorphous state, Ceramics, Crystal orientation, Crystallization, Ion beam effects, Sputtered coatings, Yttrium compounds, Zirconium compounds},
  author = {Paul H Berdahl and Ronald P Reade and Jinping Liu and Richard E Russo and Les Fritzemeier and David Buczek and Urs Schoop},
  title = {Oblique ion texturing of yttria-stabilized zirconia: the {211}<111> structure},
  abstract = {<p>Amorphous (Zr,Y)O<sub>x</sub> films were synthesized by reactive magnetron sputtering and subsequently crystallized by oblique ion bombardment. Crystalline texture nucleated by the ion beam was replicated by solid-phase epitaxial growth throughout the formerly amorphous yttria-stabilized zirconia (YSZ) film. The resulting YSZ films have (211) orientation normal to the substrate with in-plane directions (111), parallel, and (110), transverse, to the azimuth of the ion beam. We hypothesize that the texture mechanism involves ion-induced film compression and shear. The results, taken together with prior work, show that oblique ion texturing of amorphous films is a general phenomenon that can be used to fabricate substrates with more than one type of crystallographic orientation.</p>},
  year = {2003},
  journal = {Applied Physics Letters},
  volume = {82},
  pages = {343-345},
  month = {11/2002},
  issn = {0003-6951},
  doi = {10.1063/1.1536266},
  note = {<p>LBNL-51802 NOT IN FILE</p>},
  language = {eng},
}