@article{23767,
  keywords = {thin films, copper, ion implantation, sputter deposition, Thin film deposition},
  author = {Michael D Rubin and Ian G Brown and E Yin and David A Wruck},
  title = {Ion Implantation of Sputtered Y-Ba-Cu-O Films},
  abstract = {<p><span class="named-content">Thin films</span> of Y‐Ba‐Cu‐O were <span class="named-content">deposited</span> by rf magnetron <span class="named-content">sputtering</span> from a single stoichiometric target and then altered in composition by <span class="named-content">ion implantation.</span> Under optimum <span class="named-content">deposition</span> conditions the <span class="named-content">films</span> are deficient in Ba and <span class="named-content">Cu.</span> <span class="named-content">Ion implantation</span> of <span class="named-content">Cu</span> was performed using a metal‐vapor vacuum‐arc source having high current and a broad energy spectrum for good depth distribution. Composition was determined by <span class="named-content">Rutherford backscattering</span> spectrometry. The zero‐resistance temperature was greatly increased after implantation and reannealing. This method could be used to write <span class="named-content">superconducting</span> patterns on insulating material.</p>},
  year = {1989},
  journal = {Journal of Applied Physics},
  volume = {66},
  number = {8},
  pages = {3940-3942},
  month = {10/1989},
  doi = {10.1063/1.344023},
  language = {eng},
}