@article{23504,
  keywords = {Absorptivity, Coloration, Electrochemical coating, Electrochromism, Hydroxyl radicals, Microstructure, Nickel, Nickel oxides, Sputtering, Thin films},
  author = {David A Wruck and M.A Dixon and Michael D Rubin and Susan N Bogy},
  title = {As-Sputtered Electrochromic Films of Nickel Oxide},
  abstract = {<p>Electrochromic nickel oxide films were deposited by radio-frequency magnetron sputtering of a Ni target in gas mixtures of Ar and O<sub>2</sub>. When electrochemically cycled in 0.1 N KOH solution, large reversible changes in visible absorption were obtained within the first 10 bleach/color cycles. Films which showed the greatest changes in optical properties and charge capacity were produced within a narrow range of oxygen flow rates. The coloration efficiency was found to be insensitive to the sputtering conditions and stoichiometry, with a value of 34+-4 cm<sup>2</sup>C<sup>-1</sup> at 550 nm. This indicates that microstructure and charge capacity determine the absorption coefficient. The reaction rate was found to depend on the concentration of OH<sup>-</sup> in the electrolyte, indicating that OH<sup>-</sup> diffusion in the electrolyte limits the rate of reaction.</p>},
  year = {1991},
  journal = {Journal of Vacuum Science Technology A},
  volume = {9},
  number = {4},
  pages = {2170-2173},
  month = {02/1991},
  issn = {0734-2101},
  doi = {10.1116/1.577245},
  language = {eng},
}